PZT Photomask Box with N2 Purge

April 29, 2017 at 1:36 am · Filed under Cassette, Photomask, Precision Cleaning, Reduce Outgassing, Reduce Particles, Uncategorized and tagged: compact with purge, N2 Purge, N2 Purge Capability, packaging, photomask, photomask compacts, pozzetta, Purepoly ABS, shipping, storage, transfer, transport

Challenge: To develop packaging to transport, ship and store fragile substrates in an environment isolated from oxygen and humidity while also protecting from ESD, particles and outgassing.

Solution: This project concerned designing inert storage conditions for fragile substrates. We started with a photomask compact made of an inherently dissipative polymer proven in the industry to protect against ESD, particles and outgassing. The unique AU standoff design reduces particle emitting abrasion by securely holding the substrate on the beveled edges without contacting the surface. The self-aligning features of the AU standoffs reduce the risk of misplacement during insertion and removal of the device.

Once the device was secured in the compact, we created optimal inert storage conditions by adding N2 Purge capability. Traditional quick connect couplings use springs that generate particles and require lubricant, both potential sources of contamination. To address these concerns, we designed a quick connect valve that utilizes an open hose and low flow system to purge the compact and isolate the fragile substrate from oxygen and humidity.

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