Protecting Photomasks & Wafers
Pozzetta will protect your valuable products from particles, ESD damage, outgassed components, and high costsArchive for outgassing
SPIE Photomask Technology 2011, Monterey CA
Monterey, CA 19-22 September
SPIE Photomask Technology is the premier event for EUV mask making, emerging mask technologies, and the entire photomask industry.
Visit Scott and Artemis at booth # 107
Exhibition Dates and Hours:
Tuesday 20 September Exhibit. . . . . . . . 10:00 am to 4:00 pm
Tuesday 20 September Poster/Reception 6:00 pm to 7:30 pm
Wednesday 21 September Exhibit . . . . . . 10:00 am to 4:00 pm
Pozzetta to Attend EMLC in Grenoble
The 26th European Mask and Lithography Conference EMLC will take place from January 18 – 22, 2010 in Grenoble, France.
We would like to welcome you at our booth!
New Single Wafer Shipper
Protects single wafers during transport and storage.
Very low outgassing amorphous resin.
Compact and stackable
Twist top
Pin wheel base
Cushion has small point of contact with back side of wafer
Available for 50mm, 75mm, 100mm wafers
