Protecting Photomasks & Wafers
Pozzetta will protect your valuable products from particles, ESD damage, outgassed components, and high costsArchive for lithography
Reticle SMIF Pod
Reticle SMIF Pod
This Standard Mechanical Interface Pod accommodates 6025 mask with pellicle.
RSP200
Haze Control: Pod Shell made from low outgassing E80 resin.
Proprietary design of reticle support. Retainer makes contact with only reticle edge.
Clear shell provides visibility to inspect reticle location and barcode.
High performance PTFE filter; .03DOP% removal rating.
Plastic Peek screws used for easy disassembly/exchange of parts and easier maintenance.
Metal free attachment eliminates reticle scratching.
Pozzetta to Attend SPIE Advanced Lithography
Pozzetta will attend the most important event in semiconductor lithography.
Visit our booth # 625 at SPIE Advanced Lithography
Conference: February 21st to 25th 2010
Exhibit: February 23rd to 24th 2010
San Jose Convention Center
San Jose, California, USA
Pozzetta to Attend EMLC in Grenoble
The 26th European Mask and Lithography Conference EMLC will take place from January 18 – 22, 2010 in Grenoble, France.
We would like to welcome you at our booth!
